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  1. Data Management
  2. DM-31799

Develop masking for overlaps

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    Details

    • Type: Story
    • Status: In Review
    • Resolution: Unresolved
    • Fix Version/s: None
    • Component/s: ts_aos
    • Labels:

      Description

      Develop masking in case of overlapping donuts (may require WCS fitting)

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          duplicates

          Story - Created by Jira Software - do not edit or delete. Issue type for a user story. DM-33185 Develop masking using WCS and catalog positions to define overlaps for DM-33182

          • In Progress
          is child task of

          Story - Created by Jira Software - do not edit or delete. Issue type for a user story. DM-31798 Evaluate masked fitting as an initial deblender

          • In Progress
          mentioned in

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            ajc Andrew Connolly added a comment -

            As of Aug 22 we are still using ts_wep make mask as performance is acceptable (accuracy and speed)

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            ajc Andrew Connolly added a comment - As of Aug 22 we are still using ts_wep make mask as performance is acceptable (accuracy and speed)

              People

              Assignee:
              jbkalmbach Bryce Kalmbach
              Reporter:
              ajc Andrew Connolly
              Reviewers:
              Krzysztof Suberlak
              Watchers:
              Andrew Connolly, Krzysztof Suberlak, Sandrine Thomas
              Votes:
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              Watchers:
              3 Start watching this issue

                Dates

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                Created:
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